Foundry Services
Your GaN Design. Our Cleanroom.
Full GaN chip processing from your mask design to finished wafers. Lithography, etching, metallisation, passivation, all in our cleanroom, optimised for 4″ and 6” wafers. Small batches welcome, starting at just 3 wafers per design. Turnaround as fast as 5 days.
With QubeDot
Small batches from just 3 wafers, no minimum or too small
Turnaround as fast as 5 days
Personal support throughout the process
A partner who understands GaN at a fundamental level
The problem
Large foundries that won’t take your small batch
Minimum order quantities that don’t fit your R&D timeline
Months of waiting before you see your first wafers
Limited visibility into what’s happening with your design
Key Specifications
Small Batches, No Problem
Starting at 3 wafers per design. Whether you’re in early R&D or scaling to production, we process what you need, and not what fits a large foundry’s schedule.
Complete GaN Process Chain
Lithography (contact and non-contact), ICP-RIE dry etching, chemical wet etching, metal deposition, insulator deposition (SiO₂, SU-8), and more. Everything your GaN design needs, under one roof.
Turnaround as Fast as 5 Days
We know speed matters. For standard processing, we can turn wafers around in as little as 5 days. No months-long queues.
650 g. Aluminium housing. USB-C powered. Built to go wherever your samples are.
High-performance µLED illumination. 800 × 800 µm² field of view. This is what portable analysis looks like.
Technical details
Minimum Feature Size
Down to 1 µm
Emitter Sizes
1–1000 µm
Wavelength Range
290–640 nm
Minimum Batch Size
3 wafers per design
Turnaround
As fast as 5 days
Our LEDs find space in the tiniest of places, they can be packed as closely or as densely as possible.
All our products and displays are fully configurable, dimensions, pixel layout, and symbology are tuned to your application. For full specifications download datasheet.
What we process
Lithography
Dry Etching
Wet Etching
Metal Deposition
Insulator Deposition
Process Development
SPC
Sedimented Particle Counter
Need facility-wide cleanroom monitoring, but more efficient?